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LPCVD Si3N4 (Stoichiometric)

silicon nitride CVD process

Applications

- High contrast waveguides
- CMOS

Properties
(indication)

Refractive Index

2.01xx

Reproducibility of RI

5 x 10-4

Uniformity of RI

2-5 x 10-4

Optical loss (632.8 nm)

< 0.2 dB/cm

Optical loss (IR)

< 0.1 dB/cm

Max thickness

> 300 nm

Thickness uniformity

1,5 - 2 %

Thickness reproducibility

1%